204019-T-1E-RFP - MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM FOR GROWTH OF POLYCRYSTALLINE

The Microwace plasma chemical vapour deposition system will be capable of growth of (1) optical quality singel crystal diamond, with ultrhigh purity (2) optical quality singel crystla diamond, with the controlled dopant levels  (3) optical grade polycrystalline diamond (4) nanocrystalline diamond and (5) diamond-like materials. The system is expected to have a minimum of 5 kW of microwave power. Growth of diamond and diamond-like materials should be possible over a minimum diameter of 50 mm.  The instrument should be able to operate continuously for duration required to achieve growth thicknesses of more than 5 mm for diamond materials. The growth of thin films of diamond and /or diamond-like materials should also be possible. The microwave plasma chemical vapour deposition system chamber should be easily accessible for substrate mounting and maintenance by a clam-shell lid, for instance. In-situ visual monitoring of the material growth process should be possible through optical ports. In-situ temperature monitoring of both the substrate and material surface, by electronic and/or pyrometric sensors, should be provided. End-user training and instrument certification for adequate crystal growth on-site will be required.  The operation instrument shall prove to be stable and reliable for small-scale production operation of diamond.