UNIVERSITY OF WATERLOO - NOTICE OF INTENT TO AWARD A SINGLE SOURCE CONTRACT: 18-095
Cluster Tool for Molybdenum Disulfide and Atomic Layer Deposition
The University of Waterloo (UW) intends to award a single source contract to CVD Equipment Corporation, of Central Islip, New York, NY, USA, for a Chemical Vapour Deposition Cluster Tool for Molybdenum Disulfide and Atomic Layer Deposition system.
This is an Advanced Notice indicating to the supplier community that UW intends to award a contract for this equipment to a pre-identified supplier. If no other supplier submits, on or before the closing date of this notice, a statement of specifications that satisfies the stated requirements set out in this Notice, the competitive requirements of the University are considered to have been met. Following notification to any suppliers not successful in demonstrating that their statement of specifications meets the requirements set out in this Notice, the contract may then be awarded to the pre-identified supplier.
If other potential suppliers submit statements of specifications during the fifteen calendar day posting period, and meet the requirements set out in this Notice, UW will proceed to a Request for Proposal process, in order to award the contract.
SPECIFICATIONS
The required CVD system must have separate deposition chambers to deposit specific thin-film layers with sharply defined interfaces. The system will require a load lock and transfer chamber for 50mm substrates. The system must have wide and stable temperature range, multi-gas delivery system and process vacuum system in order to achieve the production of high quality nanomaterials. The system must be microprocessor-controlled with a real time information display, capable of graphing process variables, and meet the research requirement of precisely controlling all process parameters:
Instrumentation Performance Characteristic Requirements for Thin Film Synthesis
Process Vacuum System
The Cluster Tool requires a Process Vacuum System, which is designed for operation of each Process Chamber at the required specified pressures and is capable of pumping the system to a base pressure of less than 50 millitorr for leak back checking of the process chamber.
Precise Temperature Control
Temperature uniformity and stability are critical in thin film synthesis. The required system should provide a graphite resistance substrate heating system with internal thermocouples to measure the actual temperature over the substrate. The temperature control needs to provide fast and accurate temperature control by allowing the user to control temperature ramping and set point inputs.
Precise Gas Delivery and Uniform Thin Film Deposition
Gas flow uniformity affects thin film uniformity. The required system provides multiple gas injectors that allow the user to introduce different process gases at specified optimum ratios to ensure thin film deposition uniformly over a large area. A wafer rotation feature is desirable to ensure uniformity in the composition of the deposited films.
Comprehensive Safety System
The required equipment must be equipped with a comprehensive safety system that includes multiple hardware and software interlocks. These interlocks monitor system operations and facility supplies at all times. Should any event occur that could be harmful to the operator, facility or equipment, the system would take action to remove the process gases and automatically terminate the process.
Reliable and Easy-To-Maintain System.
The required equipment must be supported by years of experience in manufacturing semiconductor process equipment. The system software must provide control over process parameters, but also monitor all hardware operations. Should any problems occur, diagnosis and fix most issues through remote access over the internet is required.
Future Upgrade Capability When Necessary
The preferred equipment should be a modular system with multiple options that are essential for Molybdenum Disulfide and Atomic Layer Deposition. Field upgrades on the cluster tool to keep the equipment on the cutting edge of research are desired.
Long Term Support for Equipment and Process
The equipment supplier should have access to/in-house research lab to develop nanomaterials synthesis recipes. The equipment supplier must provide long-term equipment and process support for future years.
The budget for this purchase is less than $900,000 CAD, plus HST.
SOLE SOURCE JUSTIFICATION
Our research program requires high quality Molybdenum Disulfide, however, such material is not readily available in the marketplace. We therefore have an urgent need to acquire our own synthesis technology to supply the needed materials for ourselves, as well as for potential strategic research partners. Therefore, we are seeking the acquisition of a Chemical Vapor Deposition (CVD) system for the synthesis of Molybdenum Disulfide and Atomic Layer Deposition thin films. Specifically, CVD Equipment Corporation has developed a turnkey solution that comes complete with gas delivery and gas abatement solutions, and has successfully delivered similar equipment to Pennsylvania State University, Naval Research Laboratories, and others. CVD’s Cluster Tool as described is the only configured system that we are aware of that offers this proven functionality within budget.
Process
Suppliers who can provide equipment with this proven functionality within budget may submit a statement of specifications, in writing, to the contact person identified in this Notice on or before the closing date of this Notice. The statement of specifications must unequivocally demonstrate how the supplier meets these advertised requirements within budget.
Date of issue: Thursday, August 30, 2018
Closing Date: Monday, September 17, 2018 at 2:30 p.m. EST
Contact:
Christine Wagner, CPPB, CSCP – Research Coordinator and Senior Buyer
Procurement and Contract Services
University of Waterloo
Ph: 519-888-4567 ext. 32074
Email – cpwagner@uwaterloo.ca, or, procure@uwaterloo.ca
